[Online Quarterly Update] Chemical Mechanical Planarization (CMP) Slurry market has shown significant growth in the historical years and its market stood at 53.98 thousand tonnes as of 2021 and is anticipated to grow with a healthy CAGR of 5.03% in forecast years until 2035. This is attributed to the rising consumption of Chemical Mechanical Planarization (CMP) Slurries in downstream end uses like, semiconductors, storage devices and microchips. Chemical Mechanical Planarization (CMP) Slurries are dispersions in liquid form which contain micro-abrasive grains and active compounds for chemical mechanical planarization of semiconductors and microchips. Chemical mechanical planarization is a process of polishing the surface, and it involves chemical treatment and abrasive removal.
Chemical Mechanical Planarization (CMP) Slurries are synthesised using dispersed nanosized abrasive grains in a reactive solution. Etching through a chemical solvent softens the material, and the nanosized abrasive grains remove the material, planarizing the material's surface. The size of abrasive grains and the accumulation of particles in a slurry are the critical parameters in deciding CMP slurries' properties. The size of CMP abrasive particles ranges from 10nm – to 250nm.
Chemical Mechanical Planarization (CMP) Slurries are divided into following categories based on their type, viz. Aluminium oxide, Cerium oxide, Silica, and others. The demand for the Aluminium oxide-based CMP Slurry is around 38.51% of the total market share as of 2021. A tremendous increase in demand for Chemical Mechanical Planarization (CMP) Slurries is supported by growing demand in semiconductors and small-scale integrated circuits. Cerium oxide based Chemical Mechanical Planarization (CMP) Slurries holds around 26.44% of the total market share as of 2021 followed by Silica based slurries holding around 17% of the total market share as of 2021.
Chemical Mechanical Planarization (CMP) Slurries are used in various End Uses including silicon wafers coating, optical substrate coating and Disk-drive components coating. The main end use industries of Chemical Mechanical Planarization (CMP) Slurries are Electronics, Computer, Telecommunication and Renewable Energy. Growing demand for semiconductors, microchips, solar cells and LEDs in energy sector is expected to boost the CMP Slurry Market growth in the forecast years.
The global Chemical Mechanical Planarization (CMP) Slurry market grew at a steady pace during the historical years. However, there was a reduction in demand due to the coronavirus pandemic. In the year 2020, growth in the demand for Chemical Mechanical Planarization (CMP) Slurries saw a decline as the Electronic & Energy sector suffered a setback due to restrictions imposed during that timeframe.
Among different regions, Asia Pacific holds the largest share in the Chemical Mechanical Planarization (CMP) Slurry Market followed by North America. The Asia Pacific region is likely to dominate the market in the forecast period supported by growing solar energy sector, rising demand from telecommunication industry coupled with government initiatives for digitization. Asia Pacific regions holds around 56.65% of total market share of Chemical Mechanical Planarization (CMP) Slurry market as of 2021.
The major players operating in the Chemical Mechanical Planarization (CMP) Slurry market include Cabot Microelectronics Corporation, The Dow Chemical Company, FujiFilm corporation, Fujimi Corporation, Showa Denko K.K, Eminess Technologies Inc., Saint-Gobain S.A., Versum Materials Inc., and others.
Years considered for this report:
Historical Period: 2015-2020
Base Year: 2021
Estimated Year: 2022E
Forecast Period: 2023F–2035F
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Objective of the Study:
• To assess the demand-supply scenario of Chemical Mechanical Planarization (CMP) Slurry market which covers production, demand and supply of Chemical Mechanical Planarization (CMP) Slurries globally.
• To analyze and forecast the market size of Chemical Mechanical Planarization (CMP) Slurry market.
• To classify and forecast Global Chemical Mechanical Planarization (CMP) Slurry market based on type, End Use and regional distribution.
• To identify drivers and challenges for Chemical Mechanical Planarization (CMP) Slurry market.
• To examine competitive developments such as new product launches, mergers & acquisitions, etc., in Chemical Mechanical Planarization (CMP) Slurry market.
• To identify and analyze the profile of leading players involved in the manufacturing of chemical mechanical planarization (CMP) slurries.
To extract data for Chemical Mechanical Planarization (CMP) Slurry market, primary research surveys were conducted with manufacturers, suppliers, distributors, wholesalers, and end users. While interviewing, the respondents were also inquired about their competitors. Through this technique, ChemAnalyst was able to include manufacturers that could not be identified due to the limitations of secondary research. Moreover, ChemAnalyst analyzed various end user segments and projected a positive outlook for Global Chemical Mechanical Planarization (CMP) Slurry market over the coming years.
ChemAnalyst calculated Chemical Mechanical Planarization (CMP) Slurries demand globally by analyzing the historical data and demand forecast, which was carried out considering regional demand of CMP Slurries, chemicals used for production of CMP Slurries. ChemAnalyst sourced these values from industry experts and company representatives and externally validated through analyzing historical sales data of respective manufacturers to arrive at the overall market size. Various secondary sources such as company websites, association reports, annual reports, etc., were also studied by ChemAnalyst.
Key Target Audience:
• Chemical Mechanical Planarization (CMP) Slurries manufacturers and other stakeholders
• Organizations, forums, and alliances related to Chemical Mechanical Planarization (CMP) Slurries distribution
• Government bodies such as regulating authorities and policy makers
• Market research organizations and consulting companies
The study is useful in providing answers to several critical questions that are important for industry stakeholders such as Chemical Mechanical Planarization (CMP) Slurries manufacturers, customers and policy makers. The study would also help them to target the growing segments over the coming years (next two to five years), thereby aiding the stakeholders in taking investment decisions and facilitating their expansion.
Report Scope:
In this report, Chemical Mechanical Planarization (CMP) Slurry Market has been segmented into following categories, in addition to the industry trends which have also been detailed below:
Attribute
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Details
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Market size Volume by 2021
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53.98 thousand tonnes
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Growth Rate
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CAGR of 5.03% from 2022 to 2035
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Base year for estimation
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2021
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Historic Data
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2015 – 2020
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Forecast period
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2022 – 2035
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Quantitative units
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Demand in Million Tonnes and CAGR from 2022 to 2035
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Report coverage
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Revenue forecast, demand & supply, competitive analysis, competitive landscape, growth factors, and trends
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Segments covered
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Type (Aluminium oxide, Cerium oxide, Silica, and others)
End Use (Silicon wafers coating, Optical substrate coating, Disk-drive components coating and Others)
Sales Channel (Direct Sales & Indirect Sales)
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Regional scope
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North America; Europe; Asia Pacific; South America; Middle East & Africa
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Country scope
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United States; Mexico; Canada; China; Japan; India; Singapore; South Korea; Taiwan; Germany; France; United Kingdom; Spain; Italy; Belgium; Sweden; Australia; South Africa; Iran; Saudi Arabia; Brazil; Argentina
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Key companies profiled
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Cabot Microelectronics Corporation, The Dow Chemical Company, FujiFilm corporation, Fujimi Corporation, Showa Denko K.K, Eminess technologies Inc., Saint-Gobain S.A., Versum Materials Inc. and others.
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Customization scope
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Free report customization with purchase. Addition or alteration to country, regional & segment scope.
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Pricing and purchase options
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Available Customizations:
With the given market data, ChemAnalyst offers customizations according to a company’s specific needs.
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